Microwave ECR system

Microwave (2.45 GHz) ECR system

• PLC controlled microwave ECR system
• UHV SS vacuum chamber complete with vacuum pumping station including turbo pump based pumping
• Four line gas manifold with MFC
• 1.5 Kilowatt microwave power generator with forward and reflected power measurement, three stub tuner and special applicator with mode transfer facility
• The system is suitable for high rate etching oxides like silicon oxide and synthetic diamond deposition including Nano-diamond aligned carbon nanotubes & graphene