Microwave Plasma Enhanced Chemical Vapor Deposition

Linear Antenna Based Large Area Microwave Plasma Enhanced Chemical Vapor

Deposition

Linear Antenna Based Microwave Plasma Enhanced Chemical Vapor Deposition (MW-PECVD) is suitable to nano -diamond,

polycrystalline diamond on 300 mmx300 mm substrate. The present system is also to grow diamond like nano-composite

(DLN) film on silicon solar cells which works as an antireflection coating

The system consists of the following sub-system

• Edwards Turbo molecular pump model nEXT400D;

• Edwards XDS35i Scroll Vacuum Pump .

• Edwards Roots pump Model EH500 root;

• RF POWER SUPPLY WITH AUTRO MATCHING NETWORK

• GAS MANIFOLD MFC(4) and bellow shield valve(4)

• Monometer capacitance gauge with readout ( Baratron )

• Microwave –Plasma Array including Plasma applicator , Power supply etc. from Muegge GMBH

• PLC HMI based electrical control panel