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Microwave Plasma Enhanced Chemical Vapor Deposition

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Microwave Plasma Enhanced Chemical Vapor Deposition
Microwave Plasma Enhanced Chemical Vapor Deposition
Price And Quantity
  • Unit/Units
  • 1
  • Unit/Units
  • 100000 - 9500000 INR
    Product Specifications
    • Industrial
    • White
    • 240 Volt (v)
    • 50 Watt (w)
    • Ms
    • Digital
      Product Description

      Linear Antenna Based Large Area Microwave Plasma Enhanced Chemical Vapor


      •  Linear Antenna Based Microwave Plasma Enhanced Chemical Vapor Deposition (MW-PECVD) is suitable to nano -diamond,
      • polycrystalline diamond on 300 mmx300 mm substrate. The present system is also to grow diamond like nano-composite
      • (DLN) film on silicon solar cells which works as an antireflection coating
      • The system consists of the following sub-system
      • Edwards Turbo molecular pump model nEXT400D;
      • Edwards XDS35i Scroll Vacuum Pump .
      • Edwards Roots pump Model EH500 root;
      • RF POWER SUPPLY WITH AUTRO MATCHING NETWORK
      • GAS MANIFOLD MFC(4) and bellow shield valve(4)
      • Monometer capacitance gauge with readout ( Baratron )
      • Microwave Plasma Array including Plasma applicator , Power supply etc. from Muegge GMBH
      • PLC HMI based electrical control panel


      Trade Information
      • 4 Per Month
      • 1-16 Week
      • All India
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      Contact Us

      309, Vardhman Sudarshan Plaza, Plot No. 4, MLU, Sector-5, Dwarka, New Delhi, Delhi, 110075, India
      Phone :+918037266827