Microwave Plasma Enhanced Chemical Vapor Deposition
Price And Quantity
- Unit/Units
- 1
- Unit/Units
- 740000 INR
Product Specifications
- 240 Volt (v)
- 50 Watt (w)
- laboratory
- White
- Industrial
- Ms
- Chemical Vapor Deposition
- Digital
Product Description
Linear Antenna Based Large Area Microwave Plasma Enhanced Chemical Vapor
- Linear Antenna Based Microwave Plasma Enhanced Chemical Vapor Deposition (MW-PECVD) is suitable to nano -diamond,
- polycrystalline diamond on 300 mmx300 mm substrate. The present system is also to grow diamond like nano-composite
- (DLN) film on silicon solar cells which works as an antireflection coating
- The system consists of the following sub-system
- Edwards Turbo molecular pump model nEXT400D;
- Edwards XDS35i Scroll Vacuum Pump .
- Edwards Roots pump Model EH500 root;
- RF POWER SUPPLY WITH AUTRO MATCHING NETWORK
- GAS MANIFOLD MFC(4) and bellow shield valve(4)
- Monometer capacitance gauge with readout ( Baratron )
- Microwave Plasma Array including Plasma applicator , Power supply etc. from Muegge GMBH
- PLC HMI based electrical control panel
Trade Information
- Cash on Delivery (COD)
- 1 Per Month
- 1-2 Months
- All India
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Contact Us
309, Vardhman Sudarshan Plaza, Plot No. 4, MLU, Sector-5, Dwarka, New Delhi, Delhi, 110075, India
Phone :+918037266827