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Microwave Plasma Enhanced Chemical Vapor Deposition

Microwave Plasma Enhanced Chemical Vapor Deposition
Microwave Plasma Enhanced Chemical Vapor Deposition
Price And Quantity
  • Unit/Units
  • 1
  • Unit/Units
  • 740000 INR
    Product Specifications
    • 50 Watt (w)
    • White
    • Ms
    • Industrial
    • laboratory
    • 240 Volt (v)
    • Chemical Vapor Deposition
    • High
    • Digital
    Product Description

    Linear Antenna Based Large Area Microwave Plasma Enhanced Chemical Vapor

    Deposition



    Linear Antenna Based Microwave Plasma Enhanced Chemical Vapor Deposition (MW-PECVD) is suitable to nano -diamond,

    polycrystalline diamond on 300 mmx300 mm substrate. The present system is also to grow diamond like nano-composite

    (DLN) film on silicon solar cells which works as an antireflection coating

    The system consists of the following sub-system

    • Edwards Turbo molecular pump model nEXT400D;

    • Edwards XDS35i Scroll Vacuum Pump .

    • Edwards Roots pump Model EH500 root;

    • RF POWER SUPPLY WITH AUTRO MATCHING NETWORK

    • GAS MANIFOLD MFC(4) and bellow shield valve(4)

    • Monometer capacitance gauge with readout ( Baratron )

    • Microwave –Plasma Array including Plasma applicator , Power supply etc. from Muegge GMBH

    • PLC HMI based electrical control panel

    Trade Information
    • Cash on Delivery (COD)
    • 1 Per Month
    • 1-2 Months
    • All India
      Contact Us

      309, Vardhman Sudarshan Plaza, Plot No. 4, MLU, Sector-5, Dwarka, New Delhi, Delhi, 110075, India
      Phone :+918037266827