Mw Pecvd System

MW PECVD SYSTEM WITH RF BIASED & HEATING

• Microwave plasma enhanced chemical vapor deposition system
• UHV SS chamber complete, turbo pump based vacuum pumping, throttle valve and pirani and penning vacuum gauges etc.
• Four line gas manifold with Mass Flow Controllers.
• 1.2 Kilowatt microwave power generator, three stub tuner, E-bend , mode transfer from rectangular to circular with quartz plate MW power transfer in to vacuum chamber
• Substrate RF biased with heating arrangement
• The system is suitable to deposit polymer to diamond including diamond like carbon, Nano-diamond aligned carbon nanotubes & various other semiconductor thin films.