- Industrial Microwave Products
- Semiconductor Processing Equipments
- Scientific Instruments
- Microwave Plasma Cleaning System
- PLC controlled Wet Texturization System
- MULTI-PURPOSE UHV SYSTEM
- HepaFiltered Laminar Flow Bench (Model OSEC MANUAL
- Atmospheric Pressure Microwave -Plasma System
- Microwave Plasma Enhanced Chemical Vapor Deposition
- High Temperature Microwave Plasma Processing System
- Wet TexturizationSystem (Model OSEC MANUAL)
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- Microwave (2.45 GHz) Products
- Microwave (2.45 GHz) ECR system
- Atmospheric Controlled High Temperature Microwave Sintering
- Microwave linear antenna large area system for nanodiamod growth
- Atmospheric Pressure Microwave Plasma System
- Linear Antenna Based Large Area Microwave Plasma
- Microwave Plasma Clenar
- Microwave PECVD System 6 kw
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- Radio Frequency (13.56 MHz) Products
- Vacuum Evaporation Coating System
- Table Top Plasma Cleaner System
- RF-DC Magnetron Sputtering System
- Table Top Plasma System
- RF Power Supply Frequence 13.56 MHz Power 200 Watt
- Table Top Vacuum Evaporation Coating System
- Multi -purpose UHV System
- MW Applicator WR 340
- Voltage Frequency Genearator
- D Type Rf-dc Magnetron Sputtering System With Electrical Control Panel
- Screen Printing System
- Table Top Sputtering System
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- Cathodic & Anodic Vacuum ARC Deposition System
- Spin Coating System
- PECVD Equipment for Research and Development
- Vacuum Furnaces
- Microwave (2.45 GHz) Sintering vacuum Furnace
- High Temperature Vacuum Furnace
- Microwave (2.45 GHz) Sintering Furnace
- Vacuum EVAPORATION COATING SYSTEM
- HIGH TEMPERATURE VACUUM FURNACE
- Small Furnace
- Atmospheric Controlled High Temperature Microwave Furnace
- CVD Furnace
- Microwave Vacuum Oven
- CVD furnace
- Microwave Furnace
- Table Top Plasma System
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- Chemical Bench
- Thermal Evaporation Systems
- Scrubber