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RF Plasma Atomic Beam Etching

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RF Plasma Atomic Beam Etching
RF Plasma Atomic Beam Etching
Price And Quantity
  • Unit/Units
  • 1
  • Unit/Units
  • 100000 - 9500000 INR
    Product Specifications
    • Industrial
    • Ms
    • 240 Volt (v)
    • 50 Watt (w)
    • Digital
    Product Description

    RF Plasma Assisted Fast Atom Beam Etching

    Mild steel made RF Plasma Atomic Beam Etching equipment is used as an integral part of plasma treatment technique used during manufacturing of semi conductor systems. As part of this technique, highly reactive and energetic materials produced from  different process gases like oxygen tend to react with the sample surface. As its consequence, surface materials break down to small molecules that are finally removed by applying vacuum force. RF Plasma Atomic Beam Etching equipment offered by us has digital display arrangement. It required 240 v voltage and 50 watt power to function. Long working life is one of the key aspects of this etching system. 

    Trade Information
    • 4 Per Month
    • 1-16 Week
    • All India
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    Contact Us

    309, Vardhman Sudarshan Plaza, Plot No. 4, MLU, Sector-5, Dwarka, New Delhi, Delhi, 110075, India
    Phone :+918045812082